氧化铌膜和氧化钽膜在电解铌钽电容器中的介电性能

I. Abuetwirat, T. Palai-Dany
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引用次数: 1

摘要

使用HP (Agilent) E4980A阻抗分析仪,在20 Hz至2 MHz的频率下,在室温下测量氧化铌电容器4.7 μF/ 10 Vdc和氧化钽电容器1 μF/ 25 Vdc的复介电常数,并使用Agilent 16034E表面贴装器件(SMD)双端测试夹具。在室温下,氧化铌电容器在20Hz时复介电常数的实部为50,并在约10 kHz处观察到一个介电松弛峰。而氧化钽电容器在室温下的复介电常数实部在20Hz时为27,在约100 kHz处观察到一个介电弛豫峰。研究表明,使用100khz以下的氧化铌钽电容测量氧化铌钽薄膜的介电性能是有用的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dielectric properties of niobium oxide film and tantalum oxide film at electrolytic niobium and tantalum capacitors
Complex permittivity of the niobium oxide capacitor 4.7 μF/ 10 Vdc and tantalum oxide 1 μF/ 25 Vdc was measured at room temperature at frequencies from 20 Hz to 2 MHz using the HP (Agilent) E4980A impedance analyzer, with Agilent 16034E 2-terminal test fixture for surface mounted devices (SMD). The real part of the complex permittivity for the niobium oxide capacitor at room temperature is 50 at 20Hz with one dielectric relaxation peak, which was observed at about 10 kHz. Whereas the real part of the complex permittivity for tantalum oxide capacitor at room temperature is 27 at 20Hz with one dielectric relaxation peak, which was observed at about 100 kHz. It has been shown that to be useful to use niobium and tantalum oxide capacitor below 100 kHz for measuring the dielectric properties of niobium and tantalum oxide film.
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