阈下工作区域CMOS模拟电路的设计

E. Manolov
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引用次数: 1

摘要

本文提出了一种系统的方法,通过使用适当的预先设计的图表来设计工作在阈下区域的模拟CMOS电路的尺寸。通过对采用16nm超深亚微米CMOS技术实现的电流镜操作跨导放大器(OTA)的分析、尺寸确定和仿真来说明该方法。为此,首先讨论了16nm CMOS晶体管的基本参数和特性,并以图表的形式给出。其次,给出了当前镜像OTA的设计实例。分析了OTA的基本设计与电路参数之间的关系。讨论了在16nm CMOS技术中设计电路尺寸的考虑因素,并提出了适当的尺寸方法。给出了一个说明性实例。对所测电流反射镜OTA的尺寸测定和仿真结果进行了分析和推广。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of CMOS Analog Circuits in Subthreshold Region of Operation
The paper presents the developed systematic approach to design and size of analog CMOS circuits in subthreshold region of operation by using appropriate pre-designed charts. The methodology is illustrated by analysis, sizing and simulation of current mirror operational transconductance amplifier (OTA) implemented in 16nm ultra-deep submicron CMOS technology. For this purpose, first the basic parameters and characteristics of the 16nm CMOS transistors are discussed and presented by charts. Next, an example of designing the current mirror OTA is developed. The relations between the basic design and the circuit parameters of the OTA are analyzed. Design considerations for sizing the circuit in 16nm CMOS technology are discussed and an appropriate sizing methodology is proposed. An illustrative example is presented. The results from sizing and simulation of the examined current mirror OTA are analyzed and generalized.
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