GaInAsP合金化学束外延中III族元素的掺入

J. Carlin, A. Rudra, M. Ilegems
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引用次数: 0

摘要

作者定量地描述了GaInAsP合金化学束外延生长过程中III族元素的加入。他们报告了在480/spl°C-520/spl°C衬底温度范围内使用TEGa、TMIn、AsH/sub - 3/和PH/sub - 3/源时影响GaInAsP合金CBE生长的关键参数。铟掺入比对生长条件几乎不敏感。相比之下,两个主要因素必须考虑到镓掺入。这些因素是:(1)由于铟的存在有很强的抑制作用。这一机制不太依赖于衬底温度。(2)有磷存在时,对温度有很强的依赖性。提出了一组描述这些效应的线性关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Incorporation of group III elements in chemical beam epitaxy of GaInAsP alloys
The authors describe quantitatively the incorporation of group III elements during the chemical beam epitaxy (CBE) growth of GaInAsP alloys. They report key parameters that influence CBE growth of GaInAsP alloys when TEGa, TMIn, AsH/sub 3/ and PH/sub 3/ sources are used in the 480/spl deg/C-520/spl deg/C substrate temperature range. The indium incorporation ratio is quasi-insensitive to the growth conditions. In contrast, two main factors must be taken into account for the gallium incorporation. The factors are (1) a strong inhibition due to the presence of indium. This mechanism is not very dependent on the substrate temperature. (2) A strong temperature dependence when phosphorus is present. A set of linear relations to describe these effects is proposed.<>
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