J. Son, J. Cagnon, N. H. Finstrom, D. Boesch, J. Lu, S. Stemmer
{"title":"SrTiO3薄膜的介电和输运特性与缺陷的关系","authors":"J. Son, J. Cagnon, N. H. Finstrom, D. Boesch, J. Lu, S. Stemmer","doi":"10.1109/ISAF.2008.4693915","DOIUrl":null,"url":null,"abstract":"We report on some of the key properties of ferroelectric and high-permittivity thin films relevant for their application in metal/insulator/metal structures, such as voltage tunable capacitors and novel memories. We use a model system, Pt/SrTiO3/Pt thin film structures, with microstructures, stress states and point defects characterized by advanced transmission electron microscopy techniques, high-resolution x-ray diffraction and wafer curvature measurements. We investigate the relation between defects and dielectric properties, measured at frequencies up to 1 GHz. We discuss the origins of dielectric losses in these films and the role of point defects, such as oxygen vacancies. We report on dielectric deadlayers, which cause a significant reduction in the dielectric tunabilities. We discuss the influence of dielectric relaxation on the thermal leakage characteristics of textured and epitaxial Pt/SrTiO3/Pt thin film structures. We also discuss the properties of Pt/SrTiO3/Pt structures with ultrathin (5 ¿ 10 nm) SrTiO3 films.","PeriodicalId":228914,"journal":{"name":"2008 17th IEEE International Symposium on the Applications of Ferroelectrics","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Relationship between defects and the dielectric and transport properties of SrTiO3 thin films\",\"authors\":\"J. Son, J. Cagnon, N. H. Finstrom, D. Boesch, J. Lu, S. Stemmer\",\"doi\":\"10.1109/ISAF.2008.4693915\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report on some of the key properties of ferroelectric and high-permittivity thin films relevant for their application in metal/insulator/metal structures, such as voltage tunable capacitors and novel memories. We use a model system, Pt/SrTiO3/Pt thin film structures, with microstructures, stress states and point defects characterized by advanced transmission electron microscopy techniques, high-resolution x-ray diffraction and wafer curvature measurements. We investigate the relation between defects and dielectric properties, measured at frequencies up to 1 GHz. We discuss the origins of dielectric losses in these films and the role of point defects, such as oxygen vacancies. We report on dielectric deadlayers, which cause a significant reduction in the dielectric tunabilities. We discuss the influence of dielectric relaxation on the thermal leakage characteristics of textured and epitaxial Pt/SrTiO3/Pt thin film structures. We also discuss the properties of Pt/SrTiO3/Pt structures with ultrathin (5 ¿ 10 nm) SrTiO3 films.\",\"PeriodicalId\":228914,\"journal\":{\"name\":\"2008 17th IEEE International Symposium on the Applications of Ferroelectrics\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-12-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 17th IEEE International Symposium on the Applications of Ferroelectrics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISAF.2008.4693915\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 17th IEEE International Symposium on the Applications of Ferroelectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISAF.2008.4693915","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Relationship between defects and the dielectric and transport properties of SrTiO3 thin films
We report on some of the key properties of ferroelectric and high-permittivity thin films relevant for their application in metal/insulator/metal structures, such as voltage tunable capacitors and novel memories. We use a model system, Pt/SrTiO3/Pt thin film structures, with microstructures, stress states and point defects characterized by advanced transmission electron microscopy techniques, high-resolution x-ray diffraction and wafer curvature measurements. We investigate the relation between defects and dielectric properties, measured at frequencies up to 1 GHz. We discuss the origins of dielectric losses in these films and the role of point defects, such as oxygen vacancies. We report on dielectric deadlayers, which cause a significant reduction in the dielectric tunabilities. We discuss the influence of dielectric relaxation on the thermal leakage characteristics of textured and epitaxial Pt/SrTiO3/Pt thin film structures. We also discuss the properties of Pt/SrTiO3/Pt structures with ultrathin (5 ¿ 10 nm) SrTiO3 films.