{"title":"硅基二维蜂窝状晶格柱的KrF光刻技术","authors":"S. S. Mehta, B. Murthy, N. Singh","doi":"10.1109/NANOEL.2006.1609749","DOIUrl":null,"url":null,"abstract":"We report 248 nm KrF lithography techniques to fabricate two dimensional (2D) honey comb lattice photonic crystal on 8-inch silicon substrate . Through R-soft simulation we find maximum transverse magnetic (TM) band gap at normalized frequency of 0.322 and pillar diameter of 0.210 um for a lattice constant of 0.5 um . Experimental results show 0.214 um pillar diameter at pitch 0.5 um with good process latitude which is very close to R-soft simulation result","PeriodicalId":220722,"journal":{"name":"2006 IEEE Conference on Emerging Technologies - Nanoelectronics","volume":"01 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"KrF Lithography for Si based 2D honey comb lattice pillars\",\"authors\":\"S. S. Mehta, B. Murthy, N. Singh\",\"doi\":\"10.1109/NANOEL.2006.1609749\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report 248 nm KrF lithography techniques to fabricate two dimensional (2D) honey comb lattice photonic crystal on 8-inch silicon substrate . Through R-soft simulation we find maximum transverse magnetic (TM) band gap at normalized frequency of 0.322 and pillar diameter of 0.210 um for a lattice constant of 0.5 um . Experimental results show 0.214 um pillar diameter at pitch 0.5 um with good process latitude which is very close to R-soft simulation result\",\"PeriodicalId\":220722,\"journal\":{\"name\":\"2006 IEEE Conference on Emerging Technologies - Nanoelectronics\",\"volume\":\"01 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-03-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 IEEE Conference on Emerging Technologies - Nanoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NANOEL.2006.1609749\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE Conference on Emerging Technologies - Nanoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANOEL.2006.1609749","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
KrF Lithography for Si based 2D honey comb lattice pillars
We report 248 nm KrF lithography techniques to fabricate two dimensional (2D) honey comb lattice photonic crystal on 8-inch silicon substrate . Through R-soft simulation we find maximum transverse magnetic (TM) band gap at normalized frequency of 0.322 and pillar diameter of 0.210 um for a lattice constant of 0.5 um . Experimental results show 0.214 um pillar diameter at pitch 0.5 um with good process latitude which is very close to R-soft simulation result