采用多层高密度金属的双轴MEMS惯性传感器用于阵列CMOS-MEMS加速度计

D. Yamane, T. Matsushima, T. Konishi, H. Toshiyoshi, K. Machida, K. Masu
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引用次数: 3

摘要

本文报道了一种采用多层电镀金的新型双轴MEMS惯性传感器。所有的MEMS结构都是由镀金制成的,这是后cmos工艺。由于金的高密度,证明质量上的布朗噪声比同样大小的其他材料的布朗噪声要低。小型化的MEMS加速度计可以集成在阵列CMOS-MEMS加速度计中,在单个传感器芯片上检测大范围的加速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A dual-axis MEMS inertial sensor using multi-layered high-density metal for an arrayed CMOS-MEMS accelerometer
This paper reports a novel dual-axis MEMS inertial sensor that utilizes multi-layered electroplated gold. All the MEMS structures are made by gold electroplating that is used as post-CMOS process. Due to the high density of gold, the Brownian noise on the proof mass becomes lower than those made of other materials in the same size. The miniaturized MEMS accelerometer can be integrated in an arrayed CMOS-MEMS accelerometer to detect a broad range of acceleration on a single sensor chip.
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