基质对喷雾热解法v2o5生长的影响

2022 International Semiconductor Conference (CAS) Pub Date : 2022-10-12 DOI:10.1109/CAS56377.2022.9934671

L. Draghiciu, I. V. Tudose, C. Romanițan, R. Gavrila, O. Brîncoveanu, F. Comanescu, C. Pachiu, R. Muller, A. Dinescu, E. Koudoumas, M. Suchea

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引用次数: 0

摘要

采用空载喷雾热解法在ITO镀膜玻璃和简单玻璃上同时生长不同厚度的v2o5薄膜。观察到，衬底决定了v2o5材料完全不同的生长方式，从而产生了不同的结构和形态特征。

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Substrate influence on V2O5growth by spray pyrolisis method

Thin films of V2O5with different thickness were simultaneously grown onto ITO coated glass and simple glass by air carrier spray pyrolysis method. It was observed that the substrate determines a completely different growth of V2O5material resulting on striking different structural and morphologic features.

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2022 International Semiconductor Conference (CAS)

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