改进导电模式原子力显微镜的力调制

W. Koelmans, A. Sebastian, M. Despont, H. Pozidis
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引用次数: 3

摘要

我们提出了一种改进的导电模式原子力显微镜(C-AFM)方法,通过调制施加在尖端上的加载力。不可靠的电接触和尖端磨损是纳米尺度电学表征的主要挑战。实验表明,力调制使尖端磨损减少了三倍,并增强了尖端与样品之间的电接触,从而可以在较低的加载力下工作,并进一步减少尖端和样品的磨损。硅化铂尖端在相变介质(Ge8Sb2Te11)上的长期磨损实验表明,当加载力为10和20 nN时,其电导分别提高了9倍和2倍。由于C-AFM中长期可靠的传导仍然是一个挑战,因此所提出的技术在探针存储和计量等应用中可能具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Force modulation for improved conductive-mode atomic force microscopy
We present an improved conductive-mode atomic force microscopy (C-AFM) method by modulating the applied loading force on the tip. Unreliable electrical contact and tip wear are the primary challenges for electrical characterization at the nanometer scale. The experiments show that force modulation reduces tip wear by a factor of three and enhances electrical contact between tip and sample, which allows operation at lower loading force and further reduction of tip and sample wear. Long-term wear experiments with platinum silicide tips on phase change media (Ge8Sb2Te11) show a nine and two times higher conductance for loading forces of 10 and 20 nN, respectively. The proposed technique could be of significant importance in applications such as probe storage and metrology, as long-term, reliable conduction in C-AFM remains a challenge.
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