Chloropolymer precursor utilization for the nanostructured Co-containing carbon layers formation on silicon substrate

The possibility of nanostructured Co-containing carbon layers formation by means of the approach based on polyvinyl chloride alkaline dehydrochlorination in dimethyl sulfoxide in the presence of Co-nitrate is shown. From the mentioned reaction mixture, the layers of the carbon polymer precursor – polyvinylene formed during dehydrochlorination were deposited on the silicon wafer by spin coating. The obtained layers heat treatment up to 400 °C results in the formation of Co-carbon nanostructured continuous layers which structure is studied by the atomic force microscopy.The possibility of nanostructured Co-containing carbon layers formation by means of the approach based on polyvinyl chloride alkaline dehydrochlorination in dimethyl sulfoxide in the presence of Co-nitrate is shown. From the mentioned reaction mixture, the layers of the carbon polymer precursor – polyvinylene formed during dehydrochlorination were deposited on the silicon wafer by spin coating. The obtained layers heat treatment up to 400 °C results in the formation of Co-carbon nanostructured continuous layers which structure is studied by the atomic force microscopy.