射频前端应用1 GHz横向TPoS MEMS谐振器的设计与制造

K. N. B. Narayanan, D. Nair, A. DasGupta
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引用次数: 4

摘要

本文报道了谐振频率约为1ghz的横向激发硅基压电薄膜(TPoS) MEMS谐振器的设计、制造和表征。在5 μm SOI和0.5 μm氮化铝压电薄膜上制备了器件。我们研究了谐振腔的锚点数量和谐振腔的宽度对q因子和运动阻力的影响。声子晶体(PnC)系链器件在969.22 MHz处有一个共振峰,运动电阻为2.9 kΩ, q因子为1998。对于更宽的设备,运动阻力可以降低到770 Ω。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and fabrication of 1 GHz lateral TPoS MEMS resonator for RF front end applications
This paper reports on design, fabrication and characterization of laterally excited thin film piezoelectric on Silicon (TPoS) MEMS resonators of resonance frequency around 1 GHz. Devices were fabricated on 5 μm SOI and 0.5 μm Aluminium Nitride piezoelectric film. We studied the effect of the number of anchors attached to the resonator and the width of the resonator on Q-factor and motional resistance. Measured characteristics of the device with Phononic crystal (PnC) tether showed a resonance peak at 969.22 MHz with motional resistance 2.9 kΩ and Q-factor of 1998. The motional resistance could be reduced to 770 Ω for wider devices.
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