T. Prodromakis, P. Georgiou, T. Constandinou, K. Michelakis, C. Toumazou
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Batch encapsulation technique for CMOS based chemical sensors
This paper presents a batch encapsulation technique for CMOS based chemical sensors. SU-8 photoresist is employed as the encapsulant while the sensing membrane of the sensor is directly exposed to the solution. This approach is based on standard photolithographic techniques and thus can be used for processing multiple dies containing chemical sensors in a single step.