脉冲等离子体反应器快速上升时间电源的特性

P. Lawless, T. Yamamoto, S. Poteat, C. Boss, C. M. Nunez, G. H. Ramsey, R. Engels
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引用次数: 4

摘要

将高压直流电引入电晕等离子体反应器的旋转火花隙装置可以实现脉冲上升时间在几十纳秒的范围内。单间隙电路对产生中等峰值电压是有效的,但受到多重火花现象的限制。与单间隙电路相比,双间隙电路可以在每个火花上实现相等的峰值电压,但脉冲数量减少。随着电压和频率的变化,这两种结构都有一个由电抗器阻抗变化所施加的上电压。报道了这两种电路的脉冲特性,并进行了一些光谱分析。本文还报道了用这两种电路破坏某些化合物的反应器的一般性能。与双间隙电源相比,单间隙电源可以提供更宽的工作参数范围,但与双间隙电源相比,要表征脉冲,特别是其频率要困难得多
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characteristics of a fast rise time power supply for a pulsed plasma reactor
Rotating spark gap devices for switching high-voltage direct current into a corona plasma reactor can achieve pulse rise times in the range of tens of nanoseconds. A single-gap circuit is effective for generating moderate peak voltages, but is limited by a multiple sparking phenomenon. A double-gap circuit can achieve equal peak voltages with every spark, but with a reduced number of pulses, compared to the single gap. Both configurations have an upper voltage imposed by the changing impedance of the reactor as voltage and frequency are varied. The pulse characteristics are reported for both types of circuits, along with some spectroscopic analyses. The general performance of the reactors for destruction of some compounds with both circuits is also reported. The single-gap supply is shown to provide a wider range of operating parameters than the double-gap supply but it is much more difficult to characterize the pulses, particularly their frequency, than with the double-gap supply.<>
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