基于动力增强铜蒸气激光器的高平均功率高光束质量可见-紫外光源

D. Brown, M. Withford, R. Carman, R. Mildren, J. Piper
{"title":"基于动力增强铜蒸气激光器的高平均功率高光束质量可见-紫外光源","authors":"D. Brown, M. Withford, R. Carman, R. Mildren, J. Piper","doi":"10.1117/12.380892","DOIUrl":null,"url":null,"abstract":"Investigations of the factors that limit average power scaling of elemental copper vapor lasers (CVLs) have demonstrated that decay of the electron density in the interpulse period is critical in restricting pulse repetition rate and laser aperture scaling. We have recently developed the 'kinetic enhancement' (or KE) technique to overcome these limitations, whereby optimal plasma conditions are engineered using low concentrations of HCl/H2 additive gases in the Ne buffer. Dissociative electron attachment of HCl and subsequent mutual neutralization of Cl- and Cu+ promote rapid plasma relaxation and fast recovery of Cu densities, permitting operation at elevated Cu densities and pulse rates for given apertures. Using this approach, we have demonstrated increases in output power and efficiency of a factor of 2 or higher over conventional CVLs of the same size. For a 38 mm- bore KE-CVL, output powers up to 150 W have been achieved at 22 kHz, corresponding to record specific powers (80 mW/cm3) for such a 'small/medium-scale' device. In addition, kinetic enhancement significantly extends the gain duration and restores gain on-axis, even for high pulse rates, thereby promoting substantial increases (5 - 10x) in high- beam-quality power levels when operating with unstable resonators. This has enabled us to achieve much higher powers in second-harmonic generation from the visible copper laser output to the ultraviolet (e.g. 5 W at 255 nm from a small- scale KE-CVL). Our approach to developing KE-CVLs including computer modeling and experimental studies will be reviewed, and most recent results in pulse rate scaling and scaling of high-beam-quality power using oscillator-amplifier configurations, will be presented.","PeriodicalId":375593,"journal":{"name":"Advanced High-Power Lasers and Applications","volume":"53 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High-average-power high-beam-quality vis-UV sources based on kinetically enhanced copper vapor lasers\",\"authors\":\"D. Brown, M. Withford, R. Carman, R. Mildren, J. Piper\",\"doi\":\"10.1117/12.380892\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Investigations of the factors that limit average power scaling of elemental copper vapor lasers (CVLs) have demonstrated that decay of the electron density in the interpulse period is critical in restricting pulse repetition rate and laser aperture scaling. We have recently developed the 'kinetic enhancement' (or KE) technique to overcome these limitations, whereby optimal plasma conditions are engineered using low concentrations of HCl/H2 additive gases in the Ne buffer. Dissociative electron attachment of HCl and subsequent mutual neutralization of Cl- and Cu+ promote rapid plasma relaxation and fast recovery of Cu densities, permitting operation at elevated Cu densities and pulse rates for given apertures. Using this approach, we have demonstrated increases in output power and efficiency of a factor of 2 or higher over conventional CVLs of the same size. For a 38 mm- bore KE-CVL, output powers up to 150 W have been achieved at 22 kHz, corresponding to record specific powers (80 mW/cm3) for such a 'small/medium-scale' device. In addition, kinetic enhancement significantly extends the gain duration and restores gain on-axis, even for high pulse rates, thereby promoting substantial increases (5 - 10x) in high- beam-quality power levels when operating with unstable resonators. This has enabled us to achieve much higher powers in second-harmonic generation from the visible copper laser output to the ultraviolet (e.g. 5 W at 255 nm from a small- scale KE-CVL). Our approach to developing KE-CVLs including computer modeling and experimental studies will be reviewed, and most recent results in pulse rate scaling and scaling of high-beam-quality power using oscillator-amplifier configurations, will be presented.\",\"PeriodicalId\":375593,\"journal\":{\"name\":\"Advanced High-Power Lasers and Applications\",\"volume\":\"53 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-04-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced High-Power Lasers and Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.380892\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced High-Power Lasers and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.380892","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

对限制元素铜蒸汽激光器平均功率缩放的因素进行了研究,结果表明,脉冲间期电子密度的衰减是限制脉冲重复率和激光孔径缩放的关键因素。我们最近开发了“动力学增强”(KE)技术来克服这些限制,通过在Ne缓冲液中使用低浓度的HCl/H2添加剂气体来设计最佳等离子体条件。HCl的解离电子附着以及随后Cl-和Cu+的相互中和促进了等离子体的快速弛豫和Cu密度的快速恢复,从而允许在给定孔径下以更高的Cu密度和脉冲速率运行。使用这种方法,我们已经证明了输出功率和效率比相同尺寸的传统cvl提高了2倍或更高。对于38毫米内径的KE-CVL,在22 kHz下可实现高达150 W的输出功率,对应于这种“中小型”设备的记录特定功率(80 mW/cm3)。此外,动能增强显着延长增益持续时间并恢复轴上增益,即使在高脉冲速率下也是如此,从而在使用不稳定谐振器时促进高光束质量功率水平的大幅增加(5 - 10倍)。这使我们能够从可见铜激光器输出到紫外线的二次谐波产生更高的功率(例如,从小型KE-CVL在255 nm处产生5 W)。我们将回顾开发ke - cvl的方法,包括计算机建模和实验研究,并介绍使用振荡器放大器配置的脉冲率缩放和高光束质量功率缩放的最新结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-average-power high-beam-quality vis-UV sources based on kinetically enhanced copper vapor lasers
Investigations of the factors that limit average power scaling of elemental copper vapor lasers (CVLs) have demonstrated that decay of the electron density in the interpulse period is critical in restricting pulse repetition rate and laser aperture scaling. We have recently developed the 'kinetic enhancement' (or KE) technique to overcome these limitations, whereby optimal plasma conditions are engineered using low concentrations of HCl/H2 additive gases in the Ne buffer. Dissociative electron attachment of HCl and subsequent mutual neutralization of Cl- and Cu+ promote rapid plasma relaxation and fast recovery of Cu densities, permitting operation at elevated Cu densities and pulse rates for given apertures. Using this approach, we have demonstrated increases in output power and efficiency of a factor of 2 or higher over conventional CVLs of the same size. For a 38 mm- bore KE-CVL, output powers up to 150 W have been achieved at 22 kHz, corresponding to record specific powers (80 mW/cm3) for such a 'small/medium-scale' device. In addition, kinetic enhancement significantly extends the gain duration and restores gain on-axis, even for high pulse rates, thereby promoting substantial increases (5 - 10x) in high- beam-quality power levels when operating with unstable resonators. This has enabled us to achieve much higher powers in second-harmonic generation from the visible copper laser output to the ultraviolet (e.g. 5 W at 255 nm from a small- scale KE-CVL). Our approach to developing KE-CVLs including computer modeling and experimental studies will be reviewed, and most recent results in pulse rate scaling and scaling of high-beam-quality power using oscillator-amplifier configurations, will be presented.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信