InGaN量子盘厚度对GaN纳米线光学性能的影响

Syed M. N. Hasan, Arnob Ghosh, S. Sadaf, S. Arafin
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引用次数: 0

摘要

采用光致发光(PL)和阴极发光(CL)光谱相结合的方法研究了不同InGaN量子盘(Qdisk)厚度的轴向InGaN/GaN纳米线的光学发射特性。从InGaN qdisk相关发射的平均光谱测量结果显示,随着泵浦信号的增加,发光蓝移证明了内置压电应变的存在。为了确定材料的组成及其空间均匀性,透射电子显微镜和能量色散x射线能谱仪也进行了研究。系统分析随量子盘厚度变化的光发射特性,有助于提高对iii -氮化物纳米结构的理解,从而实现经典和非经典光电器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of InGaN Quantum Disk Thickness on the Optical Properties of GaN Nanowires
The optical emission properties of axial InGaN/GaN nanowires with different InGaN quantum disk (Qdisk) thicknesses are experimentally investigated using a combination of photoluminescence (PL) and cathodoluminescence (CL) spectroscopy. Both the spectroscopic measurements from the average InGaN Qdisk-related emissions reveal the presence of built-in piezoelectric strain as evidenced by the luminescence blueshift with increasing pump signal. To determine the material compositions and their spatial uniformity, transmission electron microscopy with energy-dispersive x-ray spectroscopy were also performed. Systematic analysis of the optical emission properties with the change of Qdisk thickness serves to advance the understanding of, in general, III-nitride nanostructures for the implementation of classical and non-classical optoelectronic devices.
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