并行设计环境中的过程/产品交互

Larry Bair
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引用次数: 6

摘要

超大规模集成电路(VLSI)工艺和内置产品之间的相互作用,一直困扰着半导体芯片的设计和制造人员。通过集成设计和制造环境中的并行流程和设计开发来最小化上市时间,从而预测、预防和最小化这些交互。过去的经验,工程保守性和灵活的设计技术使并发深亚微米CMOS VLSI设计成功。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Process/Product Interactions in a Concurrent Design Environment
The interactions between VLSI processes and the products built in them continue to perplex those who design and those who manufacture semiconductor chips. Predicting, preventing, and minimizing these interactions is compounded by attempts to minimize time-to-market through concurrent process and design development in integrated design and manufacturing environments. Past experience, engineering conservatism, and flexible design techniques enable successful concurrent deep submicron CMOS VLSI designs.
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