活性纳米结构材料中迁移率与扩散系数的爱因斯坦关系

Subhamoy Singha Roy
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引用次数: 0

摘要

众所周知,现代开关半导体的工作速度在很大程度上取决于载波的简并度。此外,半导体中载流子的扩散率与迁移率的关系(称为DMR)非常有用,因为它比扩散率与迁移率的任何单个关系都更准确,而扩散率与迁移率被认为是半导体中载流子输运中最常用的两个参数。以n-InSb和h_1 - xcdxte为例,我们将分别根据Kane的三波段和两波段模型,以及抛物线能带,研究III-V强磁量子化下的DMR。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On the Einstein relation between mobility and diffusion cofficint in an active Nanostructured Materials
It is commonly known that the speed at which contemporary switching semiconductors work much depends on the carrier degeneracy of the band. Furthermore, the relation of the diffusivity to mobility ratio of the carriers in semiconductors (referred to as DMR) is very helpful because it is more accurate than any of the individual relations for diffusivity to mobility ratio, which is thought to be the two most frequently used parameters in carrier transport in semiconductors. With n-InSb and Hg1-xCdxTe as examples of numerical calculations, we will examine DMR under strong magnetic quantization of III-V in line with the three- and two-band models of Kane, respectively, along with parabolic energy bands.
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