基于扫描非线性介电显微镜的铁电超高密度数据存储

Yasuo Cho, S. Hashimoto, N. Odagawa, K. Tanaka, Y. Hiranaga
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引用次数: 2

摘要

铁电材料的纳米倒畴点在超高密度可重写数据存储系统中具有潜在的应用前景。本文提出了一种基于扫描非线性介电显微镜和铁电单晶钽酸锂薄膜的数据存储系统。通过领域工程,我们成功构建了直径为5.1 nm的最小人工纳米域单点和存储密度为10.1 Tbit/inch2、位间距为8.0 nm的人工纳米域点阵列,代表了迄今为止报道的可重写数据存储的最高存储密度。亚纳秒(500 psec)的域切换速度也已实现。其次,通过热处理试验,研究了倒域点数据的长期保留特性。得到半径为50 nm的倒立点在80℃下的寿命为16.9年。最后,实现了低误码、高存储密度的实际信息存储。在面密度为258 Gbit/inch2时,实现了小于1倍10-4的误码率。此外,实际的信息存储密度为1 tbbit /inch2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ferroelectric Ultra High-Density Data Storage Based on Scanning Nonlinear Dielectric Microscopy
Nano-sized inverted domain dots in ferroelectric materials have potential application in ultrahigh-density rewritable data storage systems. Herein, a data storage system is presented based on scanning non-linear dielectric microscopy and a thin film of ferroelectric single-crystal lithium tantalite. Through domain engineering, we succeeded to form an smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date. Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, long term retention characteristic of data with inverted domain dots is investigated by conducting heat treatment test. Obtained life time of inverted dot with the radius of 50 nm was 16.9 years at 80degC. Finally, actual information storage with low bit error and high memory density was performed. A bit error ratio of less than 1times 10-4 was achieved at an areal density of 258 Gbit/inch2. Moreover, actual information storage is demonstrated at a density of 1 Tbit/inch2.
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