硅衬底Nb5N6缓冲超导NbN纳米线单光子探测器

Tao Xu, Jian Chen, Peiheng Wu, X. Jia, Shi Chen, Xiaoying Zhou, Jin Jin, X. Tu, La-bao Zhang, Qingyuan Zhao, L. Kang
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引用次数: 1

摘要

基于硅衬底的超导纳米线单光子探测器(SNSPDs)具有高效率、低暗计数率、短复位时间和低时序抖动等优异性能。但由于NbN与Si衬底之间的晶格不匹配,限制了薄膜的性能。为此,制备Nb5N6层作为NbN薄膜与Si衬底之间的缓冲层,减少了NbN薄膜的失配,优化了NbN薄膜的超导性能。在6nm厚的薄膜上添加65nm厚的缓冲层,薄膜的零阻临界温度(Tc0)为13.27 K,比未添加缓冲层的薄膜高5 K。基于缓冲衬底上的NbN薄膜,我们制备的SNSPD器件的临界电流$(\mathrm{I}_{\mathrm{C}})$为$65 \mu \mathrm{A}$,比无缓冲的检测器高$5 \sim 6$倍。实验结果表明,缓冲层降低了纳米线的动态电感,加快了纳米线的回弹速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nb5N6 Buffered Superconducting NbN Nanowire Single-Photon Detector on Si Substrate
Superconducting nanowire single photon detectors (SNSPDs) based on Si substrates have demonstrated excellent performance, such as high efficiency, low dark count rate, short reset time and low timing jitter. But due to the lattice mismatch between NbN and Si substrate, the performance of film is limited. To this end, Nb5N6 layer is fabricated as the buffer layer between the NbN film and Si substrate, and that will reduce the mismatch and optimize superconducting properties of NbN films. The 6nm-thick film with a 65 nm-thick buffer layer shows the zero resistance critical temperature (Tc0) of 13.27 K, which is 5 K higher than that without buffer. Based on the NbN film on the buffered substrate, we fabricated SNSPD devices demonstrate critical current $(\mathrm{I}_{\mathrm{C}})$ of $65 \mu \mathrm{A}$ which is $5 \sim 6$ times higher to the detectors without buffer. Besides, the experiment results prove that the buffer layer reduces the kinetic inductance, which fasten the recovery of nanowire.
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