清洁氧化Mo微针尖的场发射

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) Pub Date : 2004-07-11 DOI:10.1109/IVNC.2004.1354916

X. Zhao, R. Outlaw, R. Champion, J.J. Wang, D. Manos, B. Holloway

{"title":"清洁氧化Mo微针尖的场发射","authors":"X. Zhao, R. Outlaw, R. Champion, J.J. Wang, D. Manos, B. Holloway","doi":"10.1109/IVNC.2004.1354916","DOIUrl":null,"url":null,"abstract":"In this paper, measurements of field emission taken on a molybdenum<110> microtip under ultrahigh vacuum conditions and as a function of oxygen exposure were reported. Auger electron spectroscopy (AES) was used to examine the clean and oxygen saturated surface of the Mo surface and the peak-to-peak ratio of O (KLL) to Mo (LMM) as a function of oxygen exposure.","PeriodicalId":137345,"journal":{"name":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","volume":"189 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Field emission of clean and oxidized Mo<110> microtips\",\"authors\":\"X. Zhao, R. Outlaw, R. Champion, J.J. Wang, D. Manos, B. Holloway\",\"doi\":\"10.1109/IVNC.2004.1354916\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, measurements of field emission taken on a molybdenum<110> microtip under ultrahigh vacuum conditions and as a function of oxygen exposure were reported. Auger electron spectroscopy (AES) was used to examine the clean and oxygen saturated surface of the Mo surface and the peak-to-peak ratio of O (KLL) to Mo (LMM) as a function of oxygen exposure.\",\"PeriodicalId\":137345,\"journal\":{\"name\":\"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)\",\"volume\":\"189 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVNC.2004.1354916\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC.2004.1354916","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文报道了在超高真空条件下钼微针尖上的场发射及其与氧暴露的关系。利用俄歇电子能谱(AES)研究了Mo表面的清洁和氧饱和表面，以及O (KLL)与Mo (LMM)的峰峰比与氧暴露的关系。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Field emission of clean and oxidized Mo<110> microtips

In this paper, measurements of field emission taken on a molybdenum<110> microtip under ultrahigh vacuum conditions and as a function of oxygen exposure were reported. Auger electron spectroscopy (AES) was used to examine the clean and oxygen saturated surface of the Mo surface and the peak-to-peak ratio of O (KLL) to Mo (LMM) as a function of oxygen exposure.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)

自引率

0.00%

发文量