{"title":"第十七章-化学气相沉积(CVD)过程的动力学考虑","authors":"M. Hitchman","doi":"10.1016/S0069-8040(99)80022-3","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":147732,"journal":{"name":"Comprehensive Chemical Kinetics","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Chapter 17 – Some Kinetic Considerations of Chemical Vapour Deposition (CVD) Processes\",\"authors\":\"M. Hitchman\",\"doi\":\"10.1016/S0069-8040(99)80022-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":147732,\"journal\":{\"name\":\"Comprehensive Chemical Kinetics\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-12-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Comprehensive Chemical Kinetics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1016/S0069-8040(99)80022-3\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Comprehensive Chemical Kinetics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/S0069-8040(99)80022-3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}