A. K. Dokania, J. Velthuis, Yanxia Zhang, P. Kruit
{"title":"平行电子束光刻小型化肖特基发射极的热模型","authors":"A. K. Dokania, J. Velthuis, Yanxia Zhang, P. Kruit","doi":"10.1116/1.2409959","DOIUrl":null,"url":null,"abstract":"This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets","PeriodicalId":108834,"journal":{"name":"2006 19th International Vacuum Nanoelectronics Conference","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-03-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography\",\"authors\":\"A. K. Dokania, J. Velthuis, Yanxia Zhang, P. Kruit\",\"doi\":\"10.1116/1.2409959\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets\",\"PeriodicalId\":108834,\"journal\":{\"name\":\"2006 19th International Vacuum Nanoelectronics Conference\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-03-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 19th International Vacuum Nanoelectronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/1.2409959\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 19th International Vacuum Nanoelectronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/1.2409959","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography
This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets
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