工业0.5 /spl μ m CMOS技术的统计特性和设计技术的实现

S. Healy, E. Horan, K. McCarthy, A. Mathewson, Z. Ning, E. Rombouts, W. Vanderbauwhede, M. Tack
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引用次数: 2

摘要

本文介绍了一种使用商业可用工具中的BSIM3v3模型进行统计最坏情况模拟的方法。主成分分析和Box-Behnken设计等统计技术用于生成反映测量设备性能变化的模型子集。这些最坏情况角可以用于电路仿真,以解释统计波动对电路性能的影响。还提供了需要监视和控制的关键工艺参数的指示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Implementation of statistical characterisation and design techniques for an industrial 0.5 /spl mu/m CMOS technology
This paper presents a methodology for statistical worst-case simulation using the BSIM3v3 model within commercially available tools. Statistical techniques such as principal component analysis and Box-Behnken designs are used to generate a subset of models which reflect the variation of measured device performance. These worst-case corners can be used in circuit simulation to account for the effects of statistical fluctuation on circuit performance. An indication of key process parameters that need to be monitored and controlled is also provided.
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