{"title":"制造公差硅MZI滤波器","authors":"S. Dwivedi, H. D’heer, W. Bogaerts","doi":"10.1109/GROUP4.2014.6961969","DOIUrl":null,"url":null,"abstract":"A compact fabrication tolerant MZI filter is demonstrated. The measured device shows a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change.","PeriodicalId":364162,"journal":{"name":"11th International Conference on Group IV Photonics (GFP)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Fabrication tolerant silicon MZI filter\",\"authors\":\"S. Dwivedi, H. D’heer, W. Bogaerts\",\"doi\":\"10.1109/GROUP4.2014.6961969\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A compact fabrication tolerant MZI filter is demonstrated. The measured device shows a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change.\",\"PeriodicalId\":364162,\"journal\":{\"name\":\"11th International Conference on Group IV Photonics (GFP)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-11-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"11th International Conference on Group IV Photonics (GFP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2014.6961969\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"11th International Conference on Group IV Photonics (GFP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2014.6961969","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A compact fabrication tolerant MZI filter is demonstrated. The measured device shows a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change.
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