含氢气氛下GaAs PHEMT的可靠性

W. Hu, E.P. Parks, T. Yu, P. Chao, A. Swanson
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引用次数: 17

摘要

在密封封装和不同氢浓度的成型气体中进行了直流寿命试验,验证了氢对phemt的降解作用。我们发现,2 torr数量级的氢气分压会使Ids在125/spl℃下约800小时变化20%,在150/spl℃下约300小时变化20%。氢降解的特征是突然和显著的漏极电流降解,然后是一些恢复。结果表明,降解与温度和H/sub /分压有关。失效分析表明,失效发生在栅极下,主要是由于有效栅极电压被原子氢负修正所致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability of GaAs PHEMT under hydrogen containing atmosphere
Degradation of PHEMTs by hydrogen was verified by DC life tests in the hermetic packages and in the forming gases containing different hydrogen concentrations. We have found that a hydrogen partial pressure in the order of 2 torr will cause Ids change by 20% in about 800 hours at 125/spl deg/C and about 300 hours at 150/spl deg/C. The signature of hydrogen degradation is a sudden and significant drain current degradation followed by some recovery. It appeared that the degradation is both temperature and H/sub 2/ partial pressure dependent. Failure analysis indicates that the degradation is localized under the gate and that the major failure mechanism is due to the effective gate voltage being modified negatively by the atomic hydrogen.
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