功率晶体管的稳定热点和二次击穿

P. Hower, D. Blackburn, F. Oettinger, S. Rubin
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引用次数: 32

摘要

从实验和理论两方面探讨了晶体管中热点形成的机理。结果表明,在器件变得热不稳定后,器件可以在热点操作模式下重新稳定。假设热点形成前电流密度均匀,可以准确预测IC、VCE的热不稳定轨迹。提出了一个新的模型,解释了为什么器件可以在热点模式下重新稳定,以及为什么器件表现出“热滞后”。利用热成像技术还表明,在稳定的热点模式下存在发射极电流拥挤。最后,实验支持了当热点内电流密度达到临界值时发生二次击穿的观点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Stable hot spots and second breakdown in power transistors
The mechanism of hot spot formation in transistors is examined from both experimental and theoretical viewpoints. It is shown that after the device becomes thermally unstable the device may restabilize in a hot spot mode of operation. The IC, VCE thermal instability locus can accurately be predicted assuming the current density is uniform prior to hot spot formation. A new model is proposed which explains why the device may restabilize in a hot spot mode and why devices exhibit "thermal hysteresis". It is also shown using thermal mapping techniques that emitter current crowding exists in the stable hot spot mode. Finally, the experiments support the idea that second breakdown occurs when the current density within the hot spot reaches a critical value.
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