利用石墨烯/hBN多层光栅实现电信频段的低插入损耗和高调制深度可调调制器

Elnaz Gholizadeh, B. Jafari, S. Golmohammadi, H. Soofi
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引用次数: 4

摘要

本文提出了一种新型的石墨烯等离子体光栅调制器,该调制器由四层石墨烯组成,封装在hBN层中,并与Fabry-Perot (FP)腔合并。石墨烯在调制器中的主要目的是调节FP腔的谐振频率。由FP干涉仪产生的驻电场波在光栅的顶部强烈形成,在那里建立了hBN/石墨烯层。因此,石墨烯片上的传播表面等离子激元(SPPs)强烈地限制了石墨烯和光栅顶部hBN层之间的电场,导致所提出的结构的高吸收,并允许在电信波长范围内修改光信号。金电极使透射光从所提出的结构在零。因此,入射光要么被吸收,要么被反射,这给了所提出的调制器另一个特征,因为它可以在吸收和反射模式下工作,并且可以调整到任何所需的波长。此外,由于该结构的吸收光谱达到100%的高值,因此可以用作理想的吸收剂。设计了一种中心波长为$1.55\mu \mathbf{m}$、调制深度为97%(98%)、插入损耗为0.20 dB (0.22 dB)、栅极电压差为0.18 V的反射(吸收)型调制器。此外,在1.3 μm和1.8 μm波长范围内,两种调制模式的调制深度均达到97%。此外,在1-2 μm的任意波长范围内,只需通过栅极电压静电调节石墨烯化学势来调节FP干涉仪的谐振,就可以设计出许多具有不同调制参数的调制器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low insertion loss and high modulation depth Tunable modulator at Telecommunications Band enable by graphene/hBN multilayer gratings
In this paper, a novel Graphene Plasmonic Grating modulator is composed of four-layer graphene, encapsulated in hBN layers, and merged with a Fabry-Perot (FP) cavity presented. The main aim of graphene in the proposed modulator is to tune the FP cavity's resonant frequencies. The Standing electric field waves induced by the FP interferometer are strongly formed at the top of grating, where the hBN/graphene layers are established. Therefore, propagation surface plasmon polaritons (SPPs) on graphene sheets strongly confines the electric field between the graphene and hBN layer at the top of the gratings, causing the high absorption of the proposed structure and allowing for modification of the optical signals in the telecommunications range wavelengths. An Au electrode keeps transmission light from the proposed structure at zero. Therefore, the incident light is either absorbed or reflected, which gives the proposed modulator another feature since it can operate in both the absorption and reflection modes and can be adjusted to any desired wavelengths. Moreover, the proposed structure can be used as a perfect absorber since its absorption spectra reach a high value of 100 %. A reflection (absorption) type modulator with a central wavelength of $1.55\mu \mathbf{m}$, a modulation depth of 97% (98%), insertion loss of 0.20 dB (0.22 dB), with a gate voltage difference of 0.18 V is designed. In addition, the modulation depth of 97 % for both regimes are evaluated in the wavelength of 1.3 and 1.8 μm, Moreover, numerous modulators with different modulation parameters are designed in any desired wavelength of 1–2 μm simply by adjusting the FP interferometer resonance by electrostatically tuning the graphene chemical potential via gate voltage.
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