脉冲辐照下马赫-曾德电光调制器的电学和光学响应

RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294) Pub Date : 1997-09-15 DOI:10.1109/RADECS.1997.698954

C. D'hose, Eric Cassan, J. Baggie, O. Musseau, J. Leray

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引用次数: 6

摘要

首次研究了LiNbO/ sub3 /:Ti马赫-曾德尔光调制器在高剂量率高能电子脉冲下的辐射硬度。在不同的剂量率和电偏置条件下进行电学和光学测量。电和光学扰动被观察到与辐照脉冲同步，低于1克拉(Si)的总剂量阈值。所测试的各种光调制剂的光学性能与其结构有关。事实上，光扰动是由于光电流叠加到电偏置，或者是由于耦合器特性的改变。

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Electrical and optical response of a Mach-Zehnder electrooptical modulator to pulsed irradiation

Radiation hardness of LiNbO/sub 3/:Ti Mach-Zehnder optomodulators under high energy electron pulses at high dose rate is studied for the first time. Both electrical and optical measurements are performed at various dose rates and electrical bias conditions. Electrical and optical perturbations are observed to be synchronous of the irradiation pulse, below a total dose threshold of 1 krad(Si). The optical behavior of the various optomodulators under test is related to their structure. As a matter of fact, optical perturbations are due either to photocurrent which superposes to electrical bias, or to an alteration of couplers characteristics.

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RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)

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