氮化镓和砷化镓hemt的多偏置和温度三阶缺口

M. Alim, A. Rezazadeh, C. Gaquière
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引用次数: 0

摘要

详细分析了氮化镓和砷化镓场效应管的三阶陷波和阈值电压随温度的变化。为此,使用双音互调失真装置测量了- 40 ~ 150°C温度范围内的大量数据。发现三阶陷波电流点完全符合阈值电压随温度变化的趋势。晶体管的热响应在GaN中呈上升趋势,而在GaAs fet中呈下降趋势。建立了陷波电流的解析模型,并用实测数据进行了验证。这项研究代表了对研究设备行为的一些重要和彻底的理解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Third Order Notch over Multi-bias and Temperature in GaN and GaAs HEMTs
A detailed study about the shifting of third-order notch and threshold voltage with temperature for GaN and GaAs FETs were analyzed. For this purpose, a great deal of data over temperature between - 40 to 150°C were measured by using two-tone intermodulation distortion set up. It was found that the third order notch current point exactly follows the trends of threshold voltage (VT) shifting with temperature. The thermal response of VTdemonstrates a raising trend in GaN and a falling trend in GaAs FETs. An analytical model for notch current was developed and well validated with the measured data. This study represents some significant and thorough understanding to investigate the device behaviour.
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