控制压力下InP晶体的水平梯度冻结生长

G. Iseler, H. Clark
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引用次数: 3

摘要

描述了采用密封压力平衡系统的水平梯度冻结(HGF)方法进行合成和原位晶体生长而不进行封装。讨论了半绝缘InP:Ti,Hg的热稳定性,并考虑了常规方法和液包法制备Czochralski (LEC)生长。然后研究了受控P压力下HGF的合成和生长情况。由于熔体没有被封装,可以调整P压力以获得最佳的熔体成分,以最大限度地减少缺陷密度、杂质污染和孪生。此外,原位生长可以防止杂质污染,当在一个系统中合成的生长电荷转移到第二个系统中进行晶体生长时可能会导致杂质污染。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Horizontal gradient-freeze growth of InP crystals under controlled pressure
The use of a horizontal gradient-freeze (HGF) method employing a sealed pressure-balanced system for synthesis and in situ crystal growth without encapsulation is described. The thermal stability of semi-insulating InP:Ti,Hg is discussed, and synthesis by conventional methods and by liquid-encapsulated Czochralski (LEC) growth is considered. Synthesis and HGF growth under controlled P pressure are then examined. Since the melt is not encapsulated, the P pressure can be adjusted to obtain the optimum melt composition for minimizing defect density, impurity contamination, and twinning. In addition, in situ growth prevents impurity contamination that can results when a growth charge synthesized in one system is transferred to a second system for crystal growth.<>
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