硅衬底上的高性能AlGaN/GaN hemt

P. Javorka, A. Alam, A. Fox, M. Marso, M. Heuken, P. Kordos
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引用次数: 1

摘要

本文介绍了硅衬底上AlGaN/GaN hemt的性能。制备的器件显示出0.91 a /mm的饱和电流,并且与蓝宝石器件相比,可以维持更高的直流功率。由于硅的导热性较好,I/sub - ds /和g/sub - m,ext/随温度升高而明显降低。对于栅极长度为0.7和0.5 /spl mu/m的器件,单位增益截止频率f/sub /分别为32 GHz和20 GHz,最大振荡频率为27 GHz和22 GHz。这是迄今为止报道的AlGaN/GaN/Si hemt的最高值。所呈现的值可与蓝宝石和SiC衬底上的器件相媲美。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-performance AlGaN/GaN HEMTs on silicon substrates
In this work the performance of AlGaN/GaN HEMTs on silicon substrates is presented. Prepared devices exhibit a saturation current of 0.91 A/mm and sustain significantly higher DC power in comparison to devices on sapphire. Markedly lower reduction of I/sub DSs/ and g/sub m,ext/ with increased temperature due to better thermal conductivity of silicon is shown. A unity gain cutoff frequency f/sub T/ of 32 and 20 GHz and a maximum frequency of oscillation of 27 and 22 GHz are obtained for devices with gate lengths of 0.7 and 0.5 /spl mu/m, respectively. These are the highest values reported so far on AlGaN/GaN/Si HEMTs. Presented values are comparable to those known for devices on sapphire and SiC substrates.
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