影响激光干涉光刻效果的误差因素

2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale Pub Date : 2013-08-01 DOI:10.1109/3M-NANO.2013.6737387

Jin Zhang, Shilei Jiang, C. Tan, Zuobin Wang, Dayou Li, Y. Yue, Renxi Qiu, Guobin Sun, Lihong Yang, Sanlong Wang

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引用次数: 0

摘要

激光干涉光刻(LIL)技术可以定量生成孔阵列、点阵列和线阵列等周期性结构，这些结构是某些光学功能材料的固有结构。本文介绍了影响激光干涉光刻效果的最常见误差因素。本文还介绍了提高LIL图形质量的方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Error factors affecting the result of Laser Interference Lithography

Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

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2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale

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