{"title":"气溶胶辅助化学气相沉积非晶碳薄膜的光电性能","authors":"A. N. Fadzilah, K. Dayana, U. Noor, M. Rusop","doi":"10.1109/SHUSER.2012.6268825","DOIUrl":null,"url":null,"abstract":"Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm2, 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>;85%) and high absorption coefficient value (>;106 cm-1) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"44 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Opto-electrical properties of amorphous carbon thin films deposited by Aerosol-Assisted Chemical Vapor Deposition\",\"authors\":\"A. N. Fadzilah, K. Dayana, U. Noor, M. Rusop\",\"doi\":\"10.1109/SHUSER.2012.6268825\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm2, 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>;85%) and high absorption coefficient value (>;106 cm-1) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.\",\"PeriodicalId\":426671,\"journal\":{\"name\":\"2012 IEEE Symposium on Humanities, Science and Engineering Research\",\"volume\":\"44 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 IEEE Symposium on Humanities, Science and Engineering Research\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SHUSER.2012.6268825\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE Symposium on Humanities, Science and Engineering Research","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SHUSER.2012.6268825","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Opto-electrical properties of amorphous carbon thin films deposited by Aerosol-Assisted Chemical Vapor Deposition
Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm2, 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>;85%) and high absorption coefficient value (>;106 cm-1) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.
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