绝缘体膜的散射和离子发射

E. Zykova, A. Ieshkin, K. F. Minnebaev, K. E. Ozerova, N. G. Orlikovskaia, E. Rau, A. Tatarintsev
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引用次数: 0

摘要

为了确定介电样品表面电位对离子辐照过程中正离子产率的影响,我们研究了二次粒子电流与介电膜厚度的关系。结果表明,当膜的充电电位不超过由膜的电强度决定的击穿值时,正极二次粒子的产率随膜厚度的增加而显著增加。在这些实验中,间接证实薄膜充电的是来自样品支架的电流的时间依赖性。对半球形集热器发射二次电子引起的装置效应进行了实验评价。讨论了所观察到的现象的可能机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Scattering and ion emission from insulator films
To determine the effect of the surface potential of dielectric samples on the yield of positive ions during ion irradiation, we studied the dependence of the current of secondary particles on the thickness of dielectric films. It is shown that the yield of positive secondary particles increases significantly with increasing thickness if the film charging potential does not exceed the breakdown value determined by the electrical strength of the film. An indirect confirmation of the film charging in these experiments is the time dependence of the current from the sample holder. An experimental evaluation of the apparatus effect caused by the emission of secondary electrons from a hemispherical collector has been carried out. Possible mechanisms of the observed phenomena are discussed.
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