Plasmonic Color Sheet with Al Nano Periodic Structure Formed by Transfer Technique

This paper deals with plasmonic Al nanostructures on a stretchable elastomer nanosheet using polystyrene-polybutadiene-polystyrene (SBS) triblock copolymer with a film thickness of 250 nm by a transfer process with a poly(vinyl alcohol) (PVA) sacrificial layer, which provides high elastic strain of 38%. The Al submicron structures were successfully fabricated on the freestanding SBS nanosheet while the problems in fabrication using SBS nanosheet were low chemical resistance at photolithography process and the charging-up induced by electron beam or focused ion beam. The Al subwavelength gratings deployed on the SBS nanosheet demonstrated complementary reflective color filter based on optical low transmission by excitation of surface plasmons.