传统和无结MOSFET的TCAD仿真研究

N. Gupta, J. Patel, A. K. Raghav
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引用次数: 12

摘要

随着晶体管的缩小,传统的MOSFET需要严格的掺杂梯度,这是很难实现的。此外,随着规模的扩大,短通道效应越来越突出。与传统的MOSFET相反,无结晶体管没有结,其电流驱动由掺杂浓度而不是栅极电容控制。虽然接受一种无半导体结的器件进入晶体管家族是相当不正统的。与传统的MOSFET相比,无结晶体管表现出非常好的性能,特别是当沟道较短时。基本上,在无结晶体管中观察到的传导是体传导,而传统的MOSFET依赖于表面传导。本文对席尔瓦公司的无结晶体管进行了仿真,并将其性能与传统的MOSFET进行了比较。比较所需的参数可以从传输特性和输出特性中获得。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Study of Conventional and Junctionless MOSFET Using TCAD Simulations
As the transistors are scaling down, a conventional MOSFET calls for stringent doping gradients which are quite difficult to achieve. Moreover, the short channel effects become more and more prominent with scaling. Contrary to a conventional MOSFET a junction less transistor is devoid of junctions and its current drive is controlled by the doping concentration instead of the gate capacitance. Though it is quite unorthodox to accept a device sans semiconductor junctions into the family of transistors. A junction less transistor displays very good performance in comparison with a conventional MOSFET especially when the channel is short. Basically, the conduction observed in the junction less transistor is bulk conduction whereas a conventional MOSFET relies on surface conduction. This paper presents simulation of a Junction less Transistor in Silva co and comparison of its performance with that of a conventional MOSFET. The parameters needed for the comparison are to be obtained from the transfer characteristics as well as the output characteristics.
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