Y. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy
{"title":"SiOx取向膜的热降解和贮存降解及其对NLCs取向的影响","authors":"Y. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy","doi":"10.1117/12.742660","DOIUrl":null,"url":null,"abstract":"Thermal and degradation stability of SiOx aligning films deposited by reactive cathode sputtering (RCS) in glow discharge plasma has been investigated. It is shown that heat treatment and other external factors initiate transformations on the surface of aligning film and formed new conditions on the interface. It is lead to change of easy axis orientation direction of LC molecules and appearance of various defects in the LC aligned structures. The technological ways for increasing of aligning layers durability under influence of external factors has been proposed.","PeriodicalId":353385,"journal":{"name":"International Symposium on Advanced Display Technologies","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thermal and storage degradation of SiOx orienting films and its influence on NLCs alignment\",\"authors\":\"Y. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy\",\"doi\":\"10.1117/12.742660\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thermal and degradation stability of SiOx aligning films deposited by reactive cathode sputtering (RCS) in glow discharge plasma has been investigated. It is shown that heat treatment and other external factors initiate transformations on the surface of aligning film and formed new conditions on the interface. It is lead to change of easy axis orientation direction of LC molecules and appearance of various defects in the LC aligned structures. The technological ways for increasing of aligning layers durability under influence of external factors has been proposed.\",\"PeriodicalId\":353385,\"journal\":{\"name\":\"International Symposium on Advanced Display Technologies\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-05-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium on Advanced Display Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.742660\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium on Advanced Display Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.742660","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Thermal and storage degradation of SiOx orienting films and its influence on NLCs alignment
Thermal and degradation stability of SiOx aligning films deposited by reactive cathode sputtering (RCS) in glow discharge plasma has been investigated. It is shown that heat treatment and other external factors initiate transformations on the surface of aligning film and formed new conditions on the interface. It is lead to change of easy axis orientation direction of LC molecules and appearance of various defects in the LC aligned structures. The technological ways for increasing of aligning layers durability under influence of external factors has been proposed.
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