氦等离子体辐照金属表面的场电子发射

D. Hwangbo, S. Kajita, N. Ohno, D. Sinelnikov
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引用次数: 4

摘要

测量了氦等离子体辐照几种不同金属表面的场发射特性。纳米结构、针孔和环状钽表面的场发射电流明显高于抛光钽(Ta)表面。微击穿前后,电流密度在~1 μA/mm2以下时,场增强因子略有增加。击穿后电场增强系数显著增加,电流密度可达~100 μA/mm2。在扫描电镜下观察到熔化的阴极斑点。击穿后场增强因子的增加可能是由熔化点的热场电子发射引起的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Field electron emission from metal surfaces irradiated with helium plasmas
Field emission properties on several different metal surfaces irradiated with helium plasmas were measured. Field emission currents from nanostructure, pinhole, and loop-like tantalum surfaces were significantly higher than that from polished tantalum (Ta) surface. Before and after the micro-breakdown, where the current density was under ~1 μA/mm2, field enhancement factor showed slight increase. On the other hand, significant increase of field enhancement factor was measured after breakdown, where the current density increased up to ~100 μA/mm2. In the scanning electron microscope observation, melted cathode spots were detected. The increment of field enhancement factor after the breakdown may be induced by thermo-field electron emission from the melted spots.
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