等离子体增强化学气相沉积石墨烯带隙的变化

Chang-Soo Park, Hee-Sang Kim
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摘要

石墨烯是一种二维单层材料,在狄拉克点附近具有线性色散关系,由于其优异的材料特性,如室温下10,000 cm2/Vs的极高迁移率和量子霍尔效应,在纳米电子学中具有潜力,因此引起了人们的广泛关注[1-4]。然而,石墨烯是一种半金属,没有用作电子晶体管所需的能带隙。最近的研究表明,在纳米带、[5]偏压和[6]应变或分子掺杂的石墨烯[7,8]中,可以在各种情况下形成带隙。虽然在各种结构中都会产生带隙,但电性能的控制仍然是一个挑战。另一方面,石墨烯中的缺陷和杂质在电输运中是重要的,因为散射是石墨烯中载流子输运的障碍,使得石墨烯输运的调制对于物理和器件应用非常重要。特别是石墨烯中的缺陷已经被深入研究,因为空位可以在费米能量附近诱导准局域态[9,10]。在这里,我们报道了通过PECVD生长实现的带隙工程和等离子体处理可以诱导石墨烯缺陷特性的调制。采用等离子体增强化学气相沉积法(PECVD)在蓝宝石衬底上无催化剂、射频等离子体功率固定为150W、温度950℃合成石墨烯薄膜。载气为氩气(300sccm)和氢气(30sccm)。在生长过程中,烃类CH4 (1sccm)作为源前驱体。生长时间由5min调整为60min。使用光学显微镜和拉曼信号将原始石墨烯鉴定为双层。利用Horiba join - yvon, HR800UV光谱仪在514.5nm的室温激发下测量了石墨烯薄膜的拉曼光谱。利用低温测量系统(Sungwoo Instrument & Sumitomo)将电输运表征为温度的函数。深红出版社的研究迷你评论之翼
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Variation of Band Gap in Graphene Grown by Plasma Enhanced Chemical Vapor Deposition
Graphene is a two-dimensional monolayer with linear dispersion relation near the Dirac point and has attracted much interest owing to its superb material properties, such as very high mobility of 10,000 cm2/Vs at room temperature and quantum hall effect to promise for the potential in nanoelectronics [1-4]. However, graphene is a semimetal without an energy band gap which is required to be used as an electronic transistor. Recent studies have shown that band gap is formed at various situation, in nanoribbons, [5] bias-applied, and [6] strained or molecule-doped graphene [7,8]. Though the band gaps were generated in various structures, the control of the electrical properties is still a challenge. On the other hand, defects and impurities in graphene are important in electrical transport, because scattering is a hurdle in carrier transport in graphene, making the modulation of graphene transport quite important for physical and device application. In particular, defects in graphene have been intensely studied because quasi-localized states near the Fermi energy can be induced due to vacancy [9,10]. Here, we report that band gap engineering has been achieved by PECVD growth and plasma treatment can induce modulation of the defective properties of graphene. The graphene films were synthesized by plasma-enhanced chemical vapor deposition (PECVD) at 950 °C on sapphire substrate without catalyst, and the radio frequency plasma power was fixed at 150W. Carrier gas was argon (300sccm) and hydrogen (30sccm). The hydrocarbon, CH4 (1sccm) was used as a source precursor during the growth. Growth time was adjusted from 5min to 60min. Pristine graphene was identified as a bilayer using an optical microscope and Raman signal. Raman spectra of the graphene films were measured at an excitation of 514.5nm at room temperature using a spectrometer (Horiba Jobin-Yvon, HR800UV). The electrical transport was characterized as a function of temperature using low temperature measurement system (Sungwoo Instrument & Sumitomo). Crimson Publishers Wings to the Research Mini Review
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