纳米压印光刻技术制备曲面抗反射蛾眼结构(勘误)

{"title":"纳米压印光刻技术制备曲面抗反射蛾眼结构(勘误)","authors":"M. Haslinger, A. Moharana, M. Mühlberger","doi":"10.1117/12.2569999","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":306447,"journal":{"name":"35th European Mask and Lithography Conference (EMLC 2019)","volume":"72 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-02-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Antireflective moth-eye structures on curved surfaces fabricated by nanoimprint lithography (Erratum)\",\"authors\":\"M. Haslinger, A. Moharana, M. Mühlberger\",\"doi\":\"10.1117/12.2569999\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":306447,\"journal\":{\"name\":\"35th European Mask and Lithography Conference (EMLC 2019)\",\"volume\":\"72 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-02-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"35th European Mask and Lithography Conference (EMLC 2019)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2569999\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"35th European Mask and Lithography Conference (EMLC 2019)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2569999","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}