石墨烯、TMDC和碳纳米管晶体管中三态缓冲驱动器的设计和性能比较

Naheem Olakunle Adesina, Md Azmot Ullah Khan, Jian Xu
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引用次数: 0

摘要

随着芯片上晶体管数量的增加和电路性能的提高,微电子器件的尺寸不断缩小。同样,摩尔定律时代的终结即将到来,因此为了继续国际半导体技术路线图(ITRS),人们寻求另一种节能设备。在扩展摩尔定律的基础上,提出并介绍了石墨烯基晶体管、过渡金属二硫化物(TMDC)和碳纳米管(CNT)晶体管等替代器件。在这项工作中,我们研究了使用CMOS晶体管、石墨烯纳米带隧道场效应晶体管(GNR TFET)、基于二硫化钼的双栅TFET和碳纳米管FET的三态缓冲驱动器的设计,并比较了它们在功耗、延迟和功率延迟积(PDP)方面的性能。SPICE和Cadence/Spectre的仿真结果表明,在0.5 V电源电压下,基于cmos的三态缓冲器具有最差的延迟,为$\sim$ 255 ps。GNR型TFET具有高的开/关比,延迟最小。在功耗方面,CMOS技术由于漏电流大,功耗最高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and Performance Comparisons of Tri-State Buffer Driver in Graphene, TMDC, and CNT-Based Transistor Technologies
With increasing number of transistors on a chip and improved circuit’s performance, microelectronic devices are continuously scaled down in dimension. Similarly, the end of era of Moore’s law is approaching, so another energy-efficient devices are sought after in order to continue the International Technology Roadmap for Semiconductor (ITRS). Sequel to extending Moore’s law, alternative devices such as graphene-based transistor, transition metal dichalcogenide (TMDC) and carbon nanotube (CNT) transistors are proposed and introduced. In this work, we examine the design of tri-state buffer driver using CMOS transistor, graphene nanoribbon tunnel field effect transistor (GNR TFET), molybdenum disulphide-based dual gate TFET, and carbon nanotube FET, and compare their performance in terms of power consumption, delay, and power delay product (PDP). The simulation results from SPICE and Cadence/Spectre show that CMOS-based tri-state buffer has the worst delay of $\sim$ 255 ps at 0.5 V supply voltage. GNR TFET delay has the least delay because of its high on/off ratio. For power consumption, CMOS technology consumes the highest power because of its high leakage current.
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