用于带内全双工通信的100nm GaAs工艺ka波段前端

Talat Cetin, C. Onol, G. Selcuk
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引用次数: 0

摘要

在本研究中,作者介绍了一种用于带内全双工(IBFD)通信的ka波段前端。该设计由提供自干扰消除(SIC)的Rat-Race耦合器、低噪声放大器(LNA)、功率放大器(PA)和电平衡阻抗组成;全部采用UMS提供的100nm低噪声GaAs工艺实现。该电路在PA和LNA之间提供40 dB以上的隔离。天线端发射机1db压缩点为12dbm,总噪声系数优于5db。在史密斯图中,平衡阻抗覆盖3:1电压驻波比(VSWR)圈。该芯片功耗为500mw,芯片面积为7mm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Ka-Band Front-End in 100nm GaAs Process for In-Band Full Duplex Communications
In this study the authors introduce a Ka-band front-end to be used for in-band full-duplex (IBFD) communications. The design consists of a Rat-Race coupler to provide self-interference cancellation (SIC), a low noise amplifier (LNA), a power amplifier (PA) and an electrical balancing impedance; all implemented in 100nm low noise GaAs process provided by UMS. The circuit provided an isolation above 40 dB between the PA and the LNA. The 1 dB compression point of the transmitter at the antenna terminal is 12 dBm and the total noise Figure (NF) is better than 5 dB. The balancing impedance covers 3:1 voltage standing wave ratio (VSWR) circle in Smith chart. The chip consumes 500 mW power and has a die area of 7mm2.
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