Ke Xu, Rongsheng Qiu, J. Xu, Z. Fang, P. Deng, Xiaoshan Wu, Mu Wang, N. Ming
{"title":"缓冲层对蓝宝石表面GaN膜生长的影响","authors":"Ke Xu, Rongsheng Qiu, J. Xu, Z. Fang, P. Deng, Xiaoshan Wu, Mu Wang, N. Ming","doi":"10.1117/12.300713","DOIUrl":null,"url":null,"abstract":"The influence of buffer layer on the growth of GaN epilayer was investigated. Five matching orientations were identified when GaN was directly grown on the sapphire (0001) plane. The use of low-temperature buffer layer significantly improved the epitaxial film quality and the surface morphology. The optimal thickness of buffer layer was about 18 nm - 20 nm in the present growth condition.","PeriodicalId":362287,"journal":{"name":"Thin Film Physics and Applications","volume":"26 18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of buffer layer on the growth of GaN films on sapphire\",\"authors\":\"Ke Xu, Rongsheng Qiu, J. Xu, Z. Fang, P. Deng, Xiaoshan Wu, Mu Wang, N. Ming\",\"doi\":\"10.1117/12.300713\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The influence of buffer layer on the growth of GaN epilayer was investigated. Five matching orientations were identified when GaN was directly grown on the sapphire (0001) plane. The use of low-temperature buffer layer significantly improved the epitaxial film quality and the surface morphology. The optimal thickness of buffer layer was about 18 nm - 20 nm in the present growth condition.\",\"PeriodicalId\":362287,\"journal\":{\"name\":\"Thin Film Physics and Applications\",\"volume\":\"26 18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-02-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thin Film Physics and Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.300713\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Film Physics and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.300713","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effect of buffer layer on the growth of GaN films on sapphire
The influence of buffer layer on the growth of GaN epilayer was investigated. Five matching orientations were identified when GaN was directly grown on the sapphire (0001) plane. The use of low-temperature buffer layer significantly improved the epitaxial film quality and the surface morphology. The optimal thickness of buffer layer was about 18 nm - 20 nm in the present growth condition.