ω栅极纳米线SOI mosfet的固有电压增益和单位增益频率

W. Perina, J. Martino, P. Agopian
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引用次数: 4

摘要

研究了沟道宽度(WNW)和沟道长度(L)对ω栅极纳米线SOI MOSFET本征电压增益(AV)和单位增益频率(ft)的影响。计算时考虑了实验栅电容。该器件在WNW为10 nm时表现出出色的静电控制,从而改善了跨导性,从而提高了AV和ft。该技术显示AV值约为80 dB, ft值超过200 GHz,证明该器件非常适合未来的模拟应用,如5G通信和物联网(IoT)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Intrinsic Voltage Gain and Unit-Gain Frequency of Omega-Gate Nanowire SOI MOSFETs
This paper shows the influence of channel width (WNW) and channel length (L) on intrinsic voltage gain (AV) and on unit-gain frequency (ft) of omega-gate nanowire SOI MOSFET. The ft is calculated taking into consideration the experimental gate capacitance. The device showed excellent electrostatic control for the WNW of 10 nm, which improved transconductance, consequently, improving both AV and ft. This technology showed values of AV around 80 dB and a ft of over 200 GHz, proving that this device is an excellent for future analog applications like 5G communications and Internet-of-Things (IoT).
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