真空电弧中断后金属蒸气击穿的模拟

Zhenxing Wang, Yingsan Geng, Zhiyuan Liu
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引用次数: 3

摘要

真空电弧电流中断后的击穿表明真空断路器(VCB)的中断极限。本文的目的是利用粒子单元-蒙特卡罗碰撞(PIC-MCC)方法研究在中断极限密度下铜蒸气中的击穿。建立了一个物理空间为一维、速度空间为三维、接触面间距为10 mm的模型。该模型考虑了电离、激发、弹性碰撞和二次发射等因素。通过仿真得到了真空断路器瞬时击穿区域的边界。结果表明,较高的中性金属蒸气密度可以加速电子雪崩过程,但超过一定密度后影响有限。此外,较高的电压也会加速雪崩过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simulation of metal vapor breakdown after interrupting a vacuum arc
A breakdown after interrupting a vacuum arc current indicates the interruption limit of a vacuum circuit breaker (VCB). The objective of this paper is to study breakdowns in copper vapor at a density of interruption limit employing Particle in Cell-Monte Carlo Collision (PIC-MCC) method. A model with one dimension in physical space and three dimensions in velocity space was developed with a gap length of 10 mm between the contacts. The model took into account ionization, excitation, elastic collision and secondary emission. We obtained the boundary of instantaneous breakdown region of a VCB through the simulation. The results show that a higher neutral metal vapor density can accelerate the electron avalanche process but the influence was limited when the density exceeded a certain level. Moreover, a higher voltage can also accelerate the avalanche process.
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