软x射线投影光刻的反射掩模修复

Soft-X-Ray Projection Lithography Pub Date : 1900-01-01 DOI:10.1364/sxray.1992.wd3

A. Hawryluk, D. Gaines, D. Stewart

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摘要

软x射线投影光刻(SXPL)将使用一个由x射线多层镜组成的反射掩膜，上面有一层薄薄的(~50-100纳米)金层。如果SXPL要成为光刻可接受的选择，就必须开发不降低多层反射镜反射率的图案修复技术。讨论和分析了透明和不透明两种掩模修复实验的结果。

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Reflection Mask Repair for Soft-X-Ray Projection Lithography

Soft-x-ray projection lithography (SXPL) will use a reflective mask consisting of an x-ray multilayer mirror, patterned with a thin (~50-100 nm) layer of gold. Pattern repair techniques that do not degrade the multilayer mirror reflectivity must be developed if SXPL is to become an acceptable choice for lithography. Mask repair results from both clear and opaque mask repair experiments are discussed and analyzed.

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Soft-X-Ray Projection Lithography

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