视差引导纹理绘制光场视图合成

Yue Li, R. Mathew, D. Taubman
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引用次数: 0

摘要

光场作为一种视觉内容,比传统成像具有更丰富的纹理和几何信息,在视图之间会表现出很强的冗余性。视差补偿预测作为一种视图综合框架,可以利用这些冗余来达到较高的编码效率。在预测过程中正确处理纹理遮挡是很重要的。为了解决纹理遮挡问题,提出了一种视差引导的纹理绘制方案。结果表明,在被遮挡的区域内可以获得可靠的视差(深度)。本文的一个重要贡献是引入视差来指导像素访问顺序,并对绘制方案进行加权平均插值处理。具体来说,本文描述了一个差异相关的边界距离度量,该度量使用Dijkstra算法进行评估,并用于驱动喷漆决策。我们提出的方法在具有复杂几何形状的真实数据集上进行了评估,显示出令人满意的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Disparity Guided Texture Inpainting for Light Field View Synthesis
Light fields, as a type of visual content, richer in textural and geometric information than traditional imaging, can exhibit strong redundancies between views. Disparity compensated prediction, as one of the view synthesis frameworks, can exploit these redundancies to achieve high coding efficiency. Properly handling texture occlusion in the prediction process is important. We propose a disparity guided texture inpainting scheme to resolve texture occlusion. It turns out that reliable disparity (depth) can be available within occluded regions. A key contribution of this paper is the incorporation of disparity to guide the pixel visiting order and the weighted-average interpolation processes of the inpainting scheme. Specifically, the paper describes a disparity-dependent boundary distance metric, which is evaluated using a Dijkstra's algorithm and used to drive inpainting decisions. Our proposed method is evaluated on a realistic dataset with complex geometry, presenting promising results.
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