一种集成电路辐射硬度的无损检测方法

M. Awipi, S. Drews
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引用次数: 0

摘要

作为获得抗辐射电子系统的一部分,长期以来一直需要设计能够承受电离辐射影响的集成电路。设计努力的结果需要测试来验证所达到的辐射硬度的程度。但是直接使用电离辐射的测试是破坏性的,只能在产品开发过程中使用。本文提出了一种利用强磁场无损检测集成电路辐射硬度的方法。实验数据显示了电离辐射和强磁场对晶体管电流电压特性和逻辑门输入输出电压转移特性的影响之间的相关性。初步估计,8t的磁场可产生与1兆(Si)的总电离辐射剂量相同的效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A non-destructive method of testing for radiation hardness of integrated circuits
There has existed a long-standing need to design integrated circuits that withstand the effects of ionizing radiation as part of the effort to obtain radiation hardened electronic systems. The results of design efforts require testing to verify the degree of radiation hardness achieved. But testing that involves the application of ionizing radiation directly is destructive and can only be applied during product development. In this paper, we have proposed a non-destructive method of testing for radiation hardness of integrated circuits using high magnetic fields. Experimental data is included to show the correlation between the effects of ionizing radiation and high magnetic fields on the current-voltage characteristics of transistors and the input-output voltage transfer characteristics of logic gates. A preliminary estimate is made that 8 T of magnetic fields can produce the same effect as 1 Megarad (Si) of total ionizing radiation dose for testing purposes.
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