x -扫描:表征单纳米结构的光学非线性

S. Chu
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引用次数: 0

摘要

非线性光学效应是通信、传感、成像等领域的关键。最近,我们发现了基于光热相互作用的等离子体和硅纳米结构中的非线性散射/吸收,具有高对比度全光开关和非漂白超分辨率显微镜。量化光学非线性的传统方法是z扫描,该方法通常适用于薄膜,因此可以获得整体非线性响应,而不是单个纳米结构。在这里,我们提倡一种基于共聚焦激光扫描显微镜的x扫描技术,具有前向和后向检测,同时量化单个纳米结构的散射、吸收和总衰减的非线性行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
X-scan: characterizing optical nonlinearity in a single nanostructure
Nonlinear optical effects are key toward communication, sensing, imaging, etc. Recently, we found nonlinear scattering/absorption in plasmonic and silicon nanostructures based on photothermal interactions, featuring high-contrast all-optical switching and non-bleaching super-resolution microscopy. The conventional method of quantifying optical nonlinearity is z-scan, which typically works with thin films, and thus acquires ensemble nonlinear responses, not from single nanostructure. Here we advocate an x-scan technique that is based on a confocal laser scanning microscope with both forward and backward detections, offering simultaneous quantification for nonlinear behavior of scattering, absorption and total attenuation from a single nanostructure.
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