埋置接触测试结构中石墨烯对预沉积金属接触电阻率的直接测量

R. Qaisi, C. Smith, M. Ghoneim, Q. Yu, M. Hussain
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引用次数: 0

摘要

我们展示了一种基于埋藏接触的新型测试结构,用于石墨烯-金属界面的直接接触电阻率测量。我们还观察到良好的接触电阻率~1 μO-cm2,而没有任何额外的表面修饰,这表明本构金石墨烯接触足以实现低接触电阻的器件。本文描述的化学机械抛光测试结构和数据强调了石墨烯-金属接触电阻率系统筛选和工程的理想方法,以实现低功率高速碳电子器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct measurement of graphene contact resistivity to pre-deposited metal in buried contact test structure
We demonstrate a buried contact based novel test structure for direct contact resistivity measurement of graphene-metal interfaces. We also observe excellent contact resistivity ~1 μO-cm2 without any additional surface modification suggesting that the intrinsic Au-graphene contact is sufficient for achieving devices with low contact resistance. The chemical mechanical polishing less test structure and data described herein highlights an ideal methodology for systematic screening and engineering of graphene-metal contact resistivity to enable low power high speed carbon electronics.
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