用硅微镜阵列测量静电场分布

2012 IEEE International Symposium on Electromagnetic Compatibility Pub Date : 2012-11-12 DOI:10.1109/ISEMC.2012.6351823

T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto

{"title":"用硅微镜阵列测量静电场分布","authors":"T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto","doi":"10.1109/ISEMC.2012.6351823","DOIUrl":null,"url":null,"abstract":"Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.","PeriodicalId":197346,"journal":{"name":"2012 IEEE International Symposium on Electromagnetic Compatibility","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electrostatic field distribution measurement using silicon micro-mirror array\",\"authors\":\"T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto\",\"doi\":\"10.1109/ISEMC.2012.6351823\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.\",\"PeriodicalId\":197346,\"journal\":{\"name\":\"2012 IEEE International Symposium on Electromagnetic Compatibility\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-11-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 IEEE International Symposium on Electromagnetic Compatibility\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISEMC.2012.6351823\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE International Symposium on Electromagnetic Compatibility","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEMC.2012.6351823","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

介绍了利用微机电系统(MEMS)工艺制造的硅微镜阵列测量静电场分布的方法。利用二维光学扫描仪和位置敏感探测器(PSD)测量了每个微镜在静电场作用下的偏转。得到的静电数据符合库仑定律，并将该系统应用于人体模型。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Electrostatic field distribution measurement using silicon micro-mirror array

Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2012 IEEE International Symposium on Electromagnetic Compatibility

自引率

0.00%

发文量